Low-Temperature CF4/N2O Plasma Treated In2O3 Thin Film Transistors with Excellent Bias Stability
- 发表刊物:
- IEEE Semiconductor Interface Specialists Conference
- 备注:
- J Zhang, A Charnas, Z Lin, D Zheng, Z Zhang, P Liao, and P. D. Ye
- 是否译文:
- 否
- 发表时间:
- 2022-01-01