Threshold voltage modulation in monolayer MoS2 field-effect transistors via selective gallium ion beam irradiation
- 影响因子:
- 8.642
- 发表刊物:
- Science China Materials
- 备注:
- Baoshan Tang,Yunshan Zhao,Changjie Zhou,Mingkun Zhang,Huili Zhu,Yida Li,Jin Feng Leong,Hao Shuai,Hao Gong and Weifeng Yang
- 是否译文:
- 否
- 发表时间:
- 2021-01-01