Preferential creation of polar translational boundaries by interface engineering in antiferroelectric PbZrO3 thin films
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Impact Factor:
5.4
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DOI number:
10.1002/admi.201500349
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Journal:
Advanced Materials Interfaces
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Place of Publication:
GERMANY
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Co-author:
Xiankui Wei*; Kaushik Vaideeswaran, Cosmin S. Sandu, Chun-Lin Jia, Nava Setter
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Document Code:
15
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Volume:
2
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Issue:
18
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Page Number:
1500349
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Translation or Not:
no
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Date of Publication:
2015-01-01
